APPARATUS AND METHOD FOR TREATING SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide an apparatus for treating a substrate capable of repeatedly and effectively utilizing a rinsing liquid for rinsing a substrate. SOLUTION: The apparatus for treating a substrate comprises a rinsing chamber 5 in which a substrate is rinsed with a rinsing liquid, a plurality of rinsing liquid feeders 17-19 arranged along the transfer direction of the substrate in the rinsing chamber and feeding the rinsing liquid along a direction intersecting the transfer direction of the substrate, a reservoir 56 having first to third recovery sections in which the rinsing liquid fed from the plurality of rinsing liquid feeders is recovered as separate rinsing liquids, and first to third return pipes through which the separately recovered rinsing liquids in the reservoir 56 are returned to the rinsing liquid feeders situated one more upstream in the transfer direction of the substrate. COPYRIGHT: (C)2004,JPO