发明名称 |
Ultrafine-grain-copper-base sputter targets |
摘要 |
<p>The sputter target has a composition selected from the group consisting of high-purity copper and copper-base alloys. The sputter target's grain structure is at least about 99 percent recrystallized; and the sputter target's face has a grain orientation ratio of at least about 10 percent each of (111), (200), (220) and (311). In addition, the sputter target has a grain size of less than about 10 mu m for improving sputter uniformity and reducing sputter target arcing. <IMAGE></p> |
申请公布号 |
EP1382710(A1) |
申请公布日期 |
2004.01.21 |
申请号 |
EP20030016247 |
申请日期 |
2003.07.17 |
申请人 |
PRAXAIR S.T. TECHNOLOGY, INC. |
发明人 |
PERRY, ANDREW C.;GILMAN, PAUL S. |
分类号 |
C22F1/00;C22F1/08;C23C14/34;(IPC1-7):C23C14/34 |
主分类号 |
C22F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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