发明名称 |
Chip-reactor |
摘要 |
A chip reactor has a substrate base plate incorporating two or more different micro-reactor systems, each of which has a reactor chamber an educt inlet and a product outlet linked by passages. The two micro-reactors are operated or used independently of each other. Preferred Features: The substrate base plate is a compound silicon glass panel in which reactor chambers have been constructed by suitable techniques. The chamber walls are lined with silicon dioxide 50-200 nm thick. Each baseplate contains between two and 100 micro-reactor systems. The reactor chamber dimensions are in the range 50-500 m (sic) and depth 20-1800. The rector chamber cross-sectional area is 20 x 20 to 1500 x 100. The educt inlets meet at a mixing angle of 15-270 degrees . The reactor chambers have one or more mixing points which may be cooled or heated. The chip reactor contains a large number of different rector passage arrangements. Also claimed is a sandwich chip reactor. |
申请公布号 |
EP1232785(A3) |
申请公布日期 |
2004.01.21 |
申请号 |
EP20020002659 |
申请日期 |
2002.02.06 |
申请人 |
COGNIS DEUTSCHLAND GMBH & CO. KG |
发明人 |
ZECH, TORSTEN;HOENICKE, DIETER, PROF. DR. |
分类号 |
B01F5/02;B01F5/06;B01F13/00;B01F15/06;B01J19/00;B81B1/00;B81C1/00;(IPC1-7):B01J19/00;B01L7/00 |
主分类号 |
B01F5/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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