发明名称 |
Chemical adsorption solution and method of producing chemically adsorbed film using the chemical adsorption solution |
摘要 |
The present invention provides a chemical adsorption solution prepared by dissolving a silane-based chemical adsorption material in a non-aqueous organic solvent, in which the non-aqueous organic solvent is a mixture including a first non-aqueous organic solvent and a second non-aqueous organic solvent having a boiling point higher than that of the first non-aqueous organic solvent. A preferable difference in the boiling point is at least 10° C. Preferably, the first non-aqueous organic solvent has a boiling point of not more than 120° C. and the second non-aqueous organic solvent has a boiling point of not less than 150° C. The chemical adsorption solution coated on a substrate is concentrated by evaporating the solvent having the lower boiling point, so that a chemically adsorbed film having a uniform film thickness can be formed in a short time.
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申请公布号 |
US6679942(B2) |
申请公布日期 |
2004.01.20 |
申请号 |
US20010008708 |
申请日期 |
2001.11.13 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
OGAWA KAZUFUMI |
分类号 |
C09D183/04;B05D1/18;C09D4/00;(IPC1-7):C09K3/00 |
主分类号 |
C09D183/04 |
代理机构 |
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地址 |
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