发明名称 Wafer transfer system with temperature control apparatus
摘要 A wafer transfer system having a temperature control apparatus. The temperature control apparatus is constructed and arranged so that a material, element, or atomic particle may flow therethrough to heat or cool a wafer carried by the wafer transfer system. The material, element or atomic particle flowing through the temperature control apparatus causes heat to be pumped to or from an upper surface or lower surface. Preferably the temperature control apparatus is a thermoelectric device. Preferably the thermoelectric device includes a plurality of alternating N-type and P-type semiconductor pellets arranged electrically in series and thermally in parallel, and connected to a DC power supply. A switch or relay is provided for altering the direction of current flow to the thermoelectric device from a DC supply.
申请公布号 US6679064(B2) 申请公布日期 2004.01.20
申请号 US20020144521 申请日期 2002.05.13
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD 发明人 CHANG CHIH-WEI;CHANG FA-YUAN;TSENG CHENG-TING;CHEN CHIN-CHANG;CHANG CHENG-CHENG;CHEN SHIH-FANG
分类号 F25B21/04;H01L35/32;(IPC1-7):F25B21/02;H01L35/34 主分类号 F25B21/04
代理机构 代理人
主权项
地址