发明名称 |
Amorphous silicon carbide thin film coating |
摘要 |
Amorphous silicon carbide thin film structures, including: protective coatings for windows in infrared process stream monitoring systems and sensor domes, heated windows, electromagnetic interference shielding members and integrated micromachined sensors; high-temperature sensors and circuits; and diffusion barrier layers in VLSI circuits. The amorphous silicon carbide thin film structures are readily formed, e.g., by sputtering at low temperatures.
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申请公布号 |
US6680489(B1) |
申请公布日期 |
2004.01.20 |
申请号 |
US20000557165 |
申请日期 |
2000.04.25 |
申请人 |
ADVANCED TECHNOLOGY MATERIALS, INC. |
发明人 |
BRANDES GEORGE R.;CHRISTOS CHRIS S.;XU XUEPING |
分类号 |
H01J1/304;H01L21/02;H01L31/0376;(IPC1-7):H01L31/031 |
主分类号 |
H01J1/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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