发明名称 Amorphous silicon carbide thin film coating
摘要 Amorphous silicon carbide thin film structures, including: protective coatings for windows in infrared process stream monitoring systems and sensor domes, heated windows, electromagnetic interference shielding members and integrated micromachined sensors; high-temperature sensors and circuits; and diffusion barrier layers in VLSI circuits. The amorphous silicon carbide thin film structures are readily formed, e.g., by sputtering at low temperatures.
申请公布号 US6680489(B1) 申请公布日期 2004.01.20
申请号 US20000557165 申请日期 2000.04.25
申请人 ADVANCED TECHNOLOGY MATERIALS, INC. 发明人 BRANDES GEORGE R.;CHRISTOS CHRIS S.;XU XUEPING
分类号 H01J1/304;H01L21/02;H01L31/0376;(IPC1-7):H01L31/031 主分类号 H01J1/304
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