| 摘要 |
PURPOSE: An oven for baking a photoresist layer is provided to minimize contamination of an exhaust unit for exhausting contaminant and air to the outside by installing the exhaust unit in a portion under an oven body. CONSTITUTION: The oven body(100) is prepared. A wafer is placed on a settlement unit(106), installed inside the oven body. An air injecting unit(102) is formed over the oven body. The exhaust unit(104) exhaust moisture, contaminant and air inside the oven body, installed under both sides of the oven body. The air injecting unit has the first and second air injecting plates(102a,102b) including a plurality of holes in their surfaces.
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