METHOD FOR MEASURING ILLUMINATION UNIFORMITY OF SEMICONDUCTOR EXPOSURE EQUIPMENT

摘要

PURPOSE: A method for measuring illumination uniformity of semiconductor exposure equipment is provided to measure easily the illumination uniformity of a lens by using a larger linear arranging sensor than an entire exposure area of the lens. CONSTITUTION: The illumination of a light source through each part of an exposure area of a lens(300) is measured by using a sensor part(200) adhered on a stage(100) of semiconductor exposure equipment. The illumination uniformity of the lens(300) is measured by using the illumination of the light source. The sensor part(200) is formed with a plurality of sensors for measuring the illumination of the light source. The sensors are arranged linearly. The illumination uniformity of the lens(300) is measured by irradiating the light source once.