APPARATUS FOR GENERATING PLASMA

摘要

PURPOSE: An apparatus for generating plasma is provided to form uniformly the density of plasma of a position of a dome by forming constantly a thickness ratio between a center portion and an edge portion of the dome. CONSTITUTION: An apparatus for generating plasma includes a chamber, a dome used as a chamber cover, and a coil loaded on an upper portion of the dome. A predetermined side of the dome connected to the inside of the chamber has a convex center portion. A thickness ratio of the convex center portion and an edge portion of the predetermined side of the dome is n:1 where n has a domain of 1<n<=5. The domain of the width of the convex center portion is variably designed according to a size of a wafer loaded on the chamber.