METHOD OF SIMULTANEOUSLY FORMING SPACER AND DOMAIN DIVIDING PROTRUSION

摘要

PURPOSE: A method of simultaneously forming a spacer and a domain dividing protrusion is provided to simultaneously form spacers having different heights. CONSTITUTION: A photoresist is coated on a substrate(200), to form a photoresist film(201). Optical masks(MP1,MP2) having mask patterns that define the first pillar region(A) and the first protrusion region(B), respectively, are placed on the photoresist film. The photoresist film is exposed through the optical masks. The optical masks are moved by a predetermined distance such that the mask patterns define the second pillar region(A2) and the second protrusion region(B2) of the photoresist film. The photoresist film is exposed again through the optical mask. The photoresist film exposed twice is developed and then heated. The second pillar region is partially superposed on the first pillar region, and the second protrusion region is partially superposed on the first protrusion region.