发明名称 ORGANIC FILM FORMING DEVICE AND METHOD
摘要 PROBLEM TO BE SOLVED: To prevent rise in temperature of a base when an organic material in a vapor phase state is transported by using a carrier gas, to be adsorbed on the base. SOLUTION: A base cooling chamber 6 and a film forming chamber 7 are defined in a chamber 2 while partitioned by a heat insulating wall 5, and the base 3 is moved between the base cooling chamber 6 and the film forming chamber 7 by the rotation of a base holder 8. The base cooling chamber 6 is provided with a cooling gas transport tube 12 for supplying a cooling gas to the base 3. A discharge port 14 of the cooling gas transport tube 12 is mounted oppositely to an organic film deposition face of the base 3. The film deposition chamber 7 is provided with a first material gas transport tube 24a, a second material gas transport tube 24b and a third material gas transport tube 24c, respectively transporting the material gas. The formation of the organic film and the cooling of the base can be achieved by moving the base 3 between the base cooling chamber 6 and the film forming chamber 7. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004014246(A) 申请公布日期 2004.01.15
申请号 JP20020164841 申请日期 2002.06.05
申请人 SONY CORP 发明人 MEMESAWA SATOHIKO;NARUI HIRONOBU;YANASHIMA KATSUNORI;SASAKI KOJI
分类号 H05B33/10;C23C14/06;C23C14/24;H01L51/50;H05B33/14;(IPC1-7):H05B33/10 主分类号 H05B33/10
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