发明名称 Film-formation apparatus and source supplying apparatus therefor, gas concentration measuring method
摘要 A film-formation apparatus includes a film-formation chamber and a source gas supplying apparatus supplying a source gas to the film-formation chamber together with a carrier gas, wherein the source gas supplying apparatus includes a concentration detector detecting a concentration of the source gas and a gas flow controller controlling a flow rate of an inert gas added to the carrier gas based on a result of measurement of the concentration of the source gas obtained by the concentration detector.
申请公布号 US2004007180(A1) 申请公布日期 2004.01.15
申请号 US20030615926 申请日期 2003.07.10
申请人 TOKYO ELECTRON LIMITED 发明人 YAMASAKI HIDEAKI;KAWANO YUMIKO
分类号 G01N21/35;C23C16/16;C23C16/448;C23C16/455;C23C16/52;G01N21/61;G05D11/13;H01L21/31;(IPC1-7):C23C16/00;G01N7/00 主分类号 G01N21/35
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