发明名称 |
Film-formation apparatus and source supplying apparatus therefor, gas concentration measuring method |
摘要 |
A film-formation apparatus includes a film-formation chamber and a source gas supplying apparatus supplying a source gas to the film-formation chamber together with a carrier gas, wherein the source gas supplying apparatus includes a concentration detector detecting a concentration of the source gas and a gas flow controller controlling a flow rate of an inert gas added to the carrier gas based on a result of measurement of the concentration of the source gas obtained by the concentration detector.
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申请公布号 |
US2004007180(A1) |
申请公布日期 |
2004.01.15 |
申请号 |
US20030615926 |
申请日期 |
2003.07.10 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
YAMASAKI HIDEAKI;KAWANO YUMIKO |
分类号 |
G01N21/35;C23C16/16;C23C16/448;C23C16/455;C23C16/52;G01N21/61;G05D11/13;H01L21/31;(IPC1-7):C23C16/00;G01N7/00 |
主分类号 |
G01N21/35 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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