发明名称 |
MULTIRATE PROCESSING FOR METROLOGY OF PLASMA RF SOURCE |
摘要 |
An RF generator is provided for use in an RF plasma system. The RF generator includes: a power source that is operable to generate RF power signals at a tuned frequency; a sensor unit that is adapted to detect the RF power signals and operable to generate analog signals representative of the RF power signals, where the analog signals include a frequency of interest and a plurality of interfering frequency components; and a sensor signal processing unit that is adapted to receive the analog signals from the sensor unit and to band limit the analog signals within a predefined bandwidth that passes the frequency of interest and rejects interfering frequency components.
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申请公布号 |
US2004007984(A1) |
申请公布日期 |
2004.01.15 |
申请号 |
US20020192196 |
申请日期 |
2002.07.10 |
申请人 |
COUMOU DAVID J.;KIRK MICHAEL L. |
发明人 |
COUMOU DAVID J.;KIRK MICHAEL L. |
分类号 |
H05H1/46;H01J37/32;H01L21/3065;H03H17/06;(IPC1-7):H01J7/24 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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