COMPOSITIONS FOR REMOVING ETCHING RESIDUE AND USE THEREOF
摘要
<p>Compositions containing water, an organic dicarboxylic acid, a buffering agent and fluorine source and optionally a water miscible organic solvent are capable of removing etching residue.</p>
申请公布号
WO2004005211(A1)
申请公布日期
2004.01.15
申请号
WO2003US21402
申请日期
2003.07.10
申请人
AIR PRODUCTS AND CHEMICALS, INC.;ROVITO, ROBERTO, JOHN;RENNIE, DAVID, BARRY;DURHAM, DANA, L.
发明人
ROVITO, ROBERTO, JOHN;RENNIE, DAVID, BARRY;DURHAM, DANA, L.
