| 摘要 |
PROBLEM TO BE SOLVED: To provide a phosphor layer film forming method capable of grasping properly the condition of a phosphor layer film-formed actually on a substrate, and capable of forming stably a film of the phosphor layer of high quality proper in its thickness and its composition by controlling properly film formation in response to a film forming condition, in the film formation of the phosphor layer by a vacuum film forming method, and to provide a phosphor sheet manufacturing device using the method. SOLUTION: The phosphor layer formed on the substrate is irradiated with an electron beam, light emission generated by the irradiation of the electron beam is measured photometrically, and the film formation is controlled in response to a measured result therein to solve the problem. COPYRIGHT: (C)2004,JPO
|
