发明名称 PINHOLE UNIT, POINT DIFFRACTION INTERFEROMETER, AND METHOD OF MANUFACTURING PROJECTION OPTICAL SYSTEM
摘要 PROBLEM TO BE SOLVED: To reduce the intensity unevenness of the spherical waves formed by a pinhole used for a point diffraction interferometer or the like. SOLUTION: The pinhole unit is provided with a pinhole plate 12 which has the pinhole 12B of a diameter smaller than the diffraction limit of a prescribed convergent luminous fluxe and induces the spherical waves on the exit side of the pinhole 12B according to the convergent luminous fluxes made incident on the pinhole 12B and a reflection plate which is disposed on the incident side of the pinhole plate 12 so as not to hinder the optical path of the convergent luminous fluxes and guides at least part of the extra rays vignetted by the edge of the pinhole 12B among the convergent luminous fluxes. The intensity unevenness of the spherical waves can be reduced if the shape of the reflection surface 11a of the reflection plate 11 is optimized. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004012767(A) 申请公布日期 2004.01.15
申请号 JP20020165555 申请日期 2002.06.06
申请人 NIKON CORP 发明人 RYU SHIKYO
分类号 G01B9/02;G02B5/00;G02B5/10;G02B17/08;G03F7/20;H01L21/027;(IPC1-7):G02B5/00 主分类号 G01B9/02
代理机构 代理人
主权项
地址
您可能感兴趣的专利