| 摘要 |
PURPOSE: A method for fabricating a TFT(Thin Film Transistor) LCD(Liquid Crystal Display) is provided to simplify process and reduce the number of masks. CONSTITUTION: A gate insulation film is patterned, and contact windows are formed to expose certain portions of a pixel electrode and a data pad. The second metal film is formed on the entire surface of an upper portion of a substrate in which an active region and the contact windows are formed. The second metal film is patterned. An electrode(17) of a TFT, a data line(19) and an electrode(21) of a storage capacitor are formed, and the first metal layer which is a part of a pixel electrode and the data pad exposed by the contact windows is etched. A conductive silicon film is etched by using the electrode(21) of the TFT as a mask. A protective film is deposited on the entire surface of the result object. The protective film and the gate insulation film are etched, and an aperture portion is formed to expose the surface of the pixel electrode, a gate pad and the data pad. The exposed gate pad and the first metal film of the data pad are etched.
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