| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a highly reliable processing system capable of switching the atmosphere at a high speed. <P>SOLUTION: A processing container 12 provided with first and second air supply/exhaust ports 18 and 19 oppositely is turned about the center of a wafer W. Air supply nozzles 21a-21d and exhaust nozzles 22a-22d are arranged with a substantially constant interval around the processing container 12. Specified gases are supplied constantly from the air supply nozzles 21a-21d. In response to spinning of the processing container 12, the first and the second air supply/exhaust ports 18 and 19 are coupled sequentially with the air supply nozzles 21a-21d and the exhaust nozzles 22a-22d, and the interior of the processing container 12 is switched sequentially to a specified gas atmosphere. <P>COPYRIGHT: (C)2004,JPO |
