| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition which can surely dissolve and remove a resist film in an area where the resist film must be dissolved and removed when forming an image by performing exposure and development on the resist film, and whose line edge roughness is improved. <P>SOLUTION: (A) The resist composition contains a specific compound which generates an acid upon irradiation with active light or radiation. <P>COPYRIGHT: (C)2004,JPO |
