METHOD OF CLEANING SUBSTRATE TREATMENT APPARATUS

摘要

A treatment chamber having insulating substances sticking thereto is heated at 300 to 450ºC, and simultaneously a cleaning gas of vaporized hexafluoroacetylacetone (Hhfac) is fed into the treatment chamber. When the cleaning gas fed into the treatment chamber is brought into contact with insulating substances sticking to the inside wall and susceptor of the treatment chamber, complexes of substances constituting the insulating substances are formed. The vapor pressure of such complexes is so high that vaporization readily occurs. Discharging the vapor from the treatment chamber enables emission of the complexes from the treatment chamber.