| 摘要 |
An integrated lapping guide (ILG) is described including at least one read-head and an electronic lapping guide (ELG). In one embodiment, the ELG is offset from the height of the read-head. Resistance between the read-head and the ELG can be measured during the lapping process. During the initial phase of the lapping process, the ELG dominates the change in ILG resistance and provides a long-range stripe-height control allowing for inclination and bending of the row of magneto-resistive (MR) heads. During the latter phases of the lapping process, the read-head dominates the change in ILG resistance and provides a short-range, uniform read-head resistance control. In this embodiment, the transition between the long-range stripe-height control and the short-range, uniform read-head resistance control is smooth, providing a marked benefit to the read-head manufacturing process.
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