发明名称 PROCESSING SYSTEM AND PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a processing system and a processing method in which the atmosphere in a chamber can be switched at a high speed. SOLUTION: Internal space of the chamber 11 is separated into a carrying region 13 and a process region 14 by means of a separator 12 having an opening 12a. An O-ring sealing material 37 is disposed around a susceptor 29. The sealing material 37 is formed such that the overall diameter is substantially equal to the diameter of the opening 12a when it surrounds the susceptor 29. When the susceptor 29 ascends to the process position, the carrying region 13 and the process region 14 are separated airtightly. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004014952(A) 申请公布日期 2004.01.15
申请号 JP20020169323 申请日期 2002.06.10
申请人 TOKYO ELECTRON LTD 发明人 KAWANAMI HIROSHI;KOJIMA YASUHIKO;ISHIZAKA TADAHIRO;SAWADA IKUO;GUNJI ISAO
分类号 C23C16/455;H01L21/285;H01L21/68;H01L21/683;(IPC1-7):H01L21/68 主分类号 C23C16/455
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