| 发明名称 |
REDUCED-REFLECTION FILM HAVING LOW-REFRACTIVE-INDEX LAYER |
| 摘要 |
<p>A reduced-reflection film capable of reducing pen friction scarring, which has a low-refractive-index layer formed from a raw material comprising silicon oxide and a crosslinking agent as main components. The raw material contains a polymerization initiator and a polysiloxane resin in respective amounts of 1 to 10 wt.% and 1 to 5 wt.% based on the sum of silicon oxide and crosslinking agent.</p> |
| 申请公布号 |
WO2004005976(A1) |
申请公布日期 |
2004.01.15 |
| 申请号 |
WO2003JP08535 |
申请日期 |
2003.07.04 |
| 申请人 |
NOF CORPORATION;YOSHIOKA, KENSUKE;MORIMOTO, YOSHIHIRO |
发明人 |
YOSHIOKA, KENSUKE;MORIMOTO, YOSHIHIRO |
| 分类号 |
G02F1/1335;B32B7/02;B32B27/00;G02B1/10;G02B1/11;(IPC1-7):G02B1/10;G06F3/033;C08J7/04 |
主分类号 |
G02F1/1335 |
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