| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a micro device suitable for manufacturing an optical micro device such as a photonic crystal element or the like, and to realize reduction in manufacturing cost and enhancement of mass productivity. SOLUTION: The method for manufacturing a micro device is provided with: a first step for forming a first resin film 80 dissolved at a predetermined condition on a silicon substrate 70; a second step for superposing a second resin film 90 having a dissolution-proof property at a predetermined condition on this first resin film 80; a third step for transferring a predetermined transferring pattern on the second resin film 90 by pressing a stamper 100 having a mold member 101 of the predetermined transferring pattern to form a device layer 120A; a fourth step for depositing the device layer 120A on a stacker substrate 110; and a fifth step for dissolving the first resin film 80 under a predetermined condition. COPYRIGHT: (C)2004,JPO |
