PHOTOLITHOGRAPHY EQUIPMENT, PHOTOLITHOGRAPHY METHOD, AND SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To appropriately write a plurality of pattern blocks on a substrate by a light beam in accordance with the expansion and contraction of a substrate. SOLUTION: Photolithography equipment carrying out a plurality of arrangements of pattern blocks of an LSI chip on a substrate has a rasterization part 312 for rasterizing LSI data 931, an expansion and contraction calculation part 313 for obtaining the expansion and contraction rate of the substrate 9 on the basis of images from a camera 15a, a data correction part 314 for correcting raster data 932 to the expansion and contraction rate, and a data creating part 315 for generating lithography data on the basis of the corrected data. Arrangements of the pattern blocks with their widths maintained and widths of non-pattern areas between the pattern blocks varied are written with the writing data created by the data creating part 315 in accordance with the expansion and contraction of the substrate. COPYRIGHT: (C)2004,JPO