发明名称 ELECTROLESS GOLD PLATING LIQUID AND ELECTROLESS GOLD PLATING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an electroless gold plating liquid which exhibits a sufficient deposition rate even at a low liquid temperature of about 60 to 80°C, enables a satisfactory film appearance, and particularly has excellent stability. SOLUTION: The electroless gold plating liquid comprises a gold salt, a phenyl compound-based reducing agent, a heavy metal salt and a sulfur based compound. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004010964(A) 申请公布日期 2004.01.15
申请号 JP20020166187 申请日期 2002.06.06
申请人 HITACHI CHEM CO LTD 发明人 TAKAHASHI AKIO;YAMAMOTO HIROSHI;MURAKAMI KANJI
分类号 C23C18/44;(IPC1-7):C23C18/44 主分类号 C23C18/44
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