| 摘要 |
To obtain an exposure condition determined in accordance with properties of each aligner without performing complicated processes for verification of the exposure condition, a database 10 included in an exposure condition determination system 100 stores information about exposures performed in the past. Specifically, the database 10 stores mask information 11, aligner information 12, resist process information 13 and past exposure condition information 14. An exposure condition determination unit 15 determines an exposure condition suitable for a new mask in accordance with an exposure condition determination program, based on various information extracted from the database 10 and information about the new mask. Then, the exposure condition determination unit 15 outputs an exposure condition 21 for the new mask resulted from the determination. A simulation unit 16 performs an optical simulation or a development simulation using various information extracted from the database 10 and information about the new mask. A result of the simulation performed by the simulation unit 16 is used in determining the exposure condition 21 for the new mask in the exposure condition determination unit 15.
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