Method of preventing particle generation in plasma cleaning

摘要

A method to prevent particle generation from sputtering clean is disclosed. the method comprises of forming a dielectric layer on a substrate, forming a nitrogen-containing dielectric layer on the dielectric layer, forming a plurality of contact holes in the dielectric layer and the nitrogen-containing dielectric layer, coating a sacrificial layer into the contact holes and on the nitrogen-containing dielectric layer, removing the sacrificial layer and the nitrogen-containing dielectric layer on top of the dielectric layer, removing said sacrificial layer in said contact holes and performing an argon sputtering clean.