| 摘要 |
A method of guiding an electron beam (22) emitted from an electron emission source (14) to a photosensitive sample (12) through an opening provided in a stencil mask (18) and exposing it, the method comprising keeping an electron beam under a low-speed-traveling low electric field strength until the beam reaches the opening in the stencil mask, and then keeping the electron beam passed through the opening in the stencil mask under a high-speed-traveling high electric field strength. An electron beam exposure system comprising an electron emission source, a stencil mask having an opening for allowing an electron beam emitted from the electron emission source to pass therethrough, a support table (16) for supporting an exposure sample, a device for keeping an electron beam under a low electric field strength, and a high electric field generation device for keeping it under a high electric field strength. |
