发明名称 |
SYSTEM AND METHOD FOR OPTICAL METROLOGY OF SEMICONDUCTOR WAFERS |
摘要 |
<p>An optical metrology system is disclosed which is configured to minimize the measurement of specularly reflected light and measure primarily scattered light. The system is similar to prior art beam profile measurements but includes a movable baffle to selectively block specularly reflected light. In addition, certain non-periodic, isolated targets are disclosed suitable for evaluating overlay registration.</p> |
申请公布号 |
WO2004006022(A1) |
申请公布日期 |
2004.01.15 |
申请号 |
WO2003US20112 |
申请日期 |
2003.06.25 |
申请人 |
THERMA-WAVE,INC. |
发明人 |
SEZGINER, ABDURRAHMAN;ZIMMERMAN, MICHELLE |
分类号 |
G01B11/06;G01N21/21;G01N21/956;G03F7/20;(IPC1-7):G03F7/20 |
主分类号 |
G01B11/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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