发明名称 MATERIAL FOR FORMING PATTERN, FILM-LIKE PATTERN, AND PATTERN FORMING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a new pattern forming material for easily forming a fine pattern which has a smooth surface and in which a fine pattern wherein phases different by turbidity are alternately arranged in an arbitrary shape in a film surface direction, and to provide an optical pattern using the same and a forming method for the same. SOLUTION: A base material is coated with the pattern forming material of which the turbidity is thermally reversible before fixation by radiation of an electromagnetic wave but becomes thermally irreversible after fixation by radiation of the electromagnetic wave. The electromagnetic wave is radiated in accordance with a desired pattern to fix the turbidity of an irradiated part. Then a temperature condition is changed to change the turbidity of a non-irradiated part while keeping the turbidity of the irradiated part, and the electromagnetic wave is radiated over the entire surface in this state to fix the turbidity of the part which is not irradiated in a first irradiation stage. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004013135(A) 申请公布日期 2004.01.15
申请号 JP20020170849 申请日期 2002.06.12
申请人 TORAY IND INC 发明人 AOYAMA SHIGERU;TAKAHASHI HIROMITSU;SUZUKI MOTOYUKI
分类号 G02B5/18;(IPC1-7):G02B5/18 主分类号 G02B5/18
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