| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate cleaning apparatus to be used for a sheet-fed treating apparatus in which pure water can be efficiently substituted for solutions containing reagents. SOLUTION: The apparatus is provided with a second upper air knife 10 for draining liquid and with a second lower air knife 11 for draining liquid, both disposed in the slipstream side of an upper entrance shower 3 and a lower entrance shower 4 with respect to the carrying direction of a substrate 1, and in the region between the unit of the upper entrance shower 3 and the lower entrance shower 4 and the unit of an upper spray 5 and a lower spray 6, so as to drain the liquid on the surfaces of the substrate 1 which is uniformly wetted by the upper entrance shower 3 and the lower entrance shower 4. COPYRIGHT: (C)2004,JPO
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