发明名称 |
PHOTOPOLYMERIZATION INITIATOR COMPOSITION AND PHOTOPOLYMERIZABLE COMPOSITION CONTAINING THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photopolymerizable composition having high resolution and excellent alkali-resistant development and line width stability in an exposed part, and to provide a photopolymerization initiator composition used for the above composition. <P>SOLUTION: The photopolymerization initiator composition contains a dicarbonyl compound expressed by general formula (1) and a photoradical generating agent (a hexaaryl biimidazole compound and/or an organic borate compound). The photopolymerizable composition contains the above composition. <P>COPYRIGHT: (C)2004,JPO |
申请公布号 |
JP2004012820(A) |
申请公布日期 |
2004.01.15 |
申请号 |
JP20020166419 |
申请日期 |
2002.06.07 |
申请人 |
SHOWA DENKO KK |
发明人 |
KAMATA HIROTOSHI;OONISHI MINA;MUROFUSHI KATSUMI |
分类号 |
G03F7/031;C08F2/44;C08F2/50;C08F265/02;G02B5/20;G03F7/004;G03F7/029 |
主分类号 |
G03F7/031 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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