发明名称 METHOD FOR VACUUM TREATMENT AND VACUUM TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a method for a vacuum treatment and a vacuum treatment apparatus which is capable of carrying out a stable surface treatment of a substrate all the time by effectively preventing the attachment of chloride or the like to a filament of a measuring head section of a vacuum gauge and the erosion of the section by chloride or the like. SOLUTION: When starting to introduce a reaction gas or starting to supply high frequency power, the vacuum gauge 11 is insulated from an internal atmosphere of a vacuum treatment vessel 1, and the insulated state is held at least while carrying out a surface treatment of the treated substrate 7. When the inside of the vacuum treatment vessel 1 becomes the atmospheric pressure, the vacuum gauge 11 is insulated from the internal atmosphere of the vacuum treatment vessel 1, and the insulated state is held while the inside of the vacuum treatment vessel 1 is kept at the atmospheric pressure. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004015014(A) 申请公布日期 2004.01.15
申请号 JP20020170368 申请日期 2002.06.11
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 MIMURA YOSHIHIRO;MIYAJI TOSHIYUKI;ONISHI YASUHIRO;WADA TOSHIHIRO
分类号 B01J3/00;B01J19/08;C23C14/00;C23C16/44;C23F4/00;H01L21/205;H01L21/3065;(IPC1-7):H01L21/306 主分类号 B01J3/00
代理机构 代理人
主权项
地址