| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure apparatus and an exposure method whereby the contaminants present in its inside can be removed therefrom even under a vacuum atmosphere. SOLUTION: The exposure apparatus has a vacuum chamber 11, an exposure light source 21 provided in the vacuum chamber 11, and a substrate mounting table 22 provided on the path of an electron beam e emitted from the exposure light source 21. Further, this exposure apparatus has in the vacuum chamber 11 an ultraviolet-light irraduation means 41 for projecting an ultraviolet light on the region to remove contaminants therefrom and a gas feeding means 42 for blowing a gas on the ultraviolet-light irradiation region. COPYRIGHT: (C)2004,JPO
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