VERTICAL HEAT TREATMENT FURNACE AND ITS GAS INTRODUCTION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a vertical heat treatment furnace that can efficiently supply an enough amount of gas all over the surfaces of a plurality of wafers, and provide its gas introduction method. SOLUTION: The furnace is an improved vertical heat treatment furnace which has supports 12a to 12d disposed semicircularly with certain spacing inside the cylindrical furnace 11 opposing to the wafer 22 input/output side, a wafer boat 13 to horizontally support the wafers, and a gas introduction pipe 14 erected along the furnace wall opposing to the wafer 22 input/output side. Its featured constitution is that the gas introduction pipe is erected between the furnace wall and the support 12a disposed at the wafer input/output side and has a plurality of jet nozzles 23 spaced in the length direction to jet the gas parallel with the wafer surfaces and along the furnace wall of the wafer input/output side to form a swirl inside the furnace. COPYRIGHT: (C)2004,JPO