| 摘要 |
PROBLEM TO BE SOLVED: To provide a charged particle beam exposure device in which the throughput is improved by increasing the electric current of a charged particle beam while suppressing the blurring caused by the coulomb effect. SOLUTION: The charged particle beam to form an image on a sensitive substrate is, without tele-centrically radiating as conventional, widened from crossover to a lens so that a main beam of charged beams is incident to the sensitive substrate in a direction of convergence to an optical axis by the lens. Therefore, the distribution of charged particle beams from the crossover to the sensitive substrate is widened rather than a case of making it tele-centrically incident, and the coulomb effect is reduced therefor. Thus, the blurring caused by the coulomb effect is reduced so that the electric current is increased therefor and the throughput is improved. COPYRIGHT: (C)2004,JPO
|
