发明名称 HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a heat-developable photosensitive material which improves properties of a coated surface, forms a low haze transparent film, and can suppress contamination of the photosensitive material due to leaving of fingerprints after touch by using a specified fluorine compound. SOLUTION: The heat-developable photosensitive material comprises a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent for heat development, and a binder, and further contains a fluorine compound having one or more≥2C fluoroalkyl groups having≤12 F atoms and one or more anionic hydrophilic groups, and a compound represented by formula (1). COPYRIGHT: (C)2004,JPO
申请公布号 JP2004012534(A) 申请公布日期 2004.01.15
申请号 JP20020161935 申请日期 2002.06.03
申请人 FUJI PHOTO FILM CO LTD 发明人 YOSHIOKA YASUHIRO;YANAGI TERUKAZU
分类号 G03C1/76;G03C1/498;(IPC1-7):G03C1/76 主分类号 G03C1/76
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