PLASMA TREATMENT APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus for generating highly uniform plasma even when treating a large-area substrate.

SOLUTION: The plasma treatment apparatus comprises a waveguide antenna 3 for arranging a plurality of slits 2a-2d along the propagation direction 11 of a microwave, and an electromagnetic wave radiation window 4 made of dielectric where the plasma treatment apparatus generates plasma by electromagnetic waves radiated from the waveguide antenna 3 through the electromagnetic wave radiation window 4. In the plasma treatment apparatus, angles θ of the slits 2a-2d relative to the propagation direction 11 of the microwave change in steps, and the angle θ of the slit 2d at a position where electromagnetic field strength is minimized is set to 90°.

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