PLASMA PROCESSING EQUIPMENT

摘要

Plasma processing equipment, comprising a processing container formed by an outer wall and having a holding table for holding a processed substrate, an exhaust system connected to the processing container, a microwave transmission window provided as a part of the outer wall so as to face the processed substrate on the holding table, a plasma gas feed part for feeding plasma gas into the processing container, and a microwave antenna installed on the processing container so as to match microwave, the plasma gas feed part further comprising porous medium, wherein the plasma gas is fed to the processing container through the porous medium.