发明名称 SUBSTRATE TREATMENT SYSTEM
摘要 PROBLEM TO BE SOLVED: To efficiently form a wiring protective film or the like on the surface of a substrate at a low initial cost and a low running cost without requiring a wide installation space. SOLUTION: The system is provided with a load/unload area 10 housing a load/unload unit 18 mounted with the primary conveyance robot 22 having a plurality of hands in dry specifics and a substrate cassette 16 with a substrate housed, a cleaning area 12 housing the second conveyance robot 36 having a plurality of hands in wet specifics and a cleaning unit 26 of performing cleaning for the substrate, and a plating treatment area 14 housing the third conveyance robot 46 having hands of a back face adsorption type, pretreatment units 38 and 40 of performing treatment to plating and an electroless plating treatment unit 42 of performing plating treatment. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004010961(A) 申请公布日期 2004.01.15
申请号 JP20020166111 申请日期 2002.06.06
申请人 EBARA CORP 发明人 KATSUOKA SEIJI;SEKIMOTO MASAHIKO;YOKOYAMA TOSHIO;WATANABE TERUYUKI;OGAWA TAKAHIRO;KOBAYASHI KENICHI;MIYAZAKI MITSURU;MOTOJIMA YASUYUKI
分类号 B65G49/07;C23C18/31;H01L21/288;H01L21/677;H01L21/68;(IPC1-7):C23C18/31 主分类号 B65G49/07
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