发明名称 |
Capacitor and method for fabricating the same |
摘要 |
<p>A capacitor is formed on an interlayer insulating film formed on a semiconductor substrate. The capacitor includes a bottom electrode made of platinum, a capacitor insulating film made of SrTaBiO (SBT) containing an element absorbing hydrogen such as titanium, for example, in grain boundaries, inter-lattice positions or holes, and a top electrode made of platinum.</p> |
申请公布号 |
EP1381077(A2) |
申请公布日期 |
2004.01.14 |
申请号 |
EP20030013062 |
申请日期 |
2003.06.10 |
申请人 |
PANASONIC CORPORATION |
发明人 |
MIKAWA, TAKUMI;JUDAI, YUJI;HAYASHI, SHINICHIRO |
分类号 |
H01L21/316;H01L21/02;H01L21/8246;H01L27/105;H01L27/108;(IPC1-7):H01L21/02 |
主分类号 |
H01L21/316 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|