METHOD FOR PRODUCING A MANGANESE ALLOY SPUTTERING TARGET

摘要

A manganese alloy sputtering target characterized in that oxygen is 1000ppm or less, sulfur is 200ppm or less and a forged texture is provided, and a method for producing a forged manganese alloy target stably by eliminating the drawbacks of manganese alloy that it is susceptible to cracking and has a low rupture strength. <??>A manganese alloy sputtering target which can form a thin film exhibiting high characteristics and high corrosion resistance while suppressing generation of nodules or particles is thereby obtained. <IMAGE>