发明名称 Apparatus and process for fluorination treatment of substrates
摘要 <p>Disclosed is a fluorination treatment apparatus comprising a fluorine gas storage/feed vessel for storing and feeding a fluorine gas, a reactor for bringing a substance to be treated into contact with a fluorine gas to carry out fluorination reaction, and a fluorine gas pipe arranged between the fluorine gas storage/feed vessel and the reactor. Also disclosed is a process for producing a fluorination treated substance, comprising an enclosure step of enclosing a substance to be treated in a reactor and a fluorination reaction step of introducing a fluorine gas into the reactor to bring the substance to be treated into contact with the fluorine gas and thereby carry out fluorination reaction. According to the invention, a fluorination treated substance remarkably reduced in the light absorption loss of a substance to be treated, such as a fluoride thin film, a fluorination treatment apparatus capable of producing the fluorination treated substance, and a process for producing a fluorination treated substance can be provided.</p>
申请公布号 EP1380855(A2) 申请公布日期 2004.01.14
申请号 EP20030015384 申请日期 2003.07.08
申请人 SHOWA DENKO K.K.;NIKON CORPORATION 发明人 HOSHINO, YASUYUKI;TAKI, YUSUKE
分类号 B01J19/02;C23C8/02;C23C14/58;(IPC1-7):G02B1/02;G02B1/12;B01L5/00 主分类号 B01J19/02
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