POSITIVE PHOTOSENSITIVE COATING MATERIAL COMPOSITION, METHOD FOR PRODUCING POSITIVE PHOTOSENSITIVE RESIN AND PATTERN FORMING METHOD

摘要

PURPOSE: To provide a positive photosensitive coating material composition and a pattern forming method using the coating material composition. CONSTITUTION: The positive photosensitive coating material composition is obtained by blending 100 pts.wt. positive photosensitive resin having a specified modified quinonediazidosulfonamide as a structural unit in one molecule, containing this structural unit at a concentration of 0.1-0.9 mol in 1 kg resin, also having a specified carboxylic acid amide derivative as a structural unit and containing this structural unit at a concentration of 0.2-4.0 mol in 1 kg resin with 1-50 pts.wt. at least one component selected from phenolic resins, phenol derivatives and catechol derivatives.