发明名称 |
Device and method for fabricating diffractive gratings |
摘要 |
There is provided a grating fabrication device and method to form gratings on a semiconductor substrate. The substrate is loaded into a reactor filled with an etchant solution, and an array of parallel light of interference light with different periods is projected onto the substrate to etch the portion of the substrate that is exposed to the light via an oxidation-reduction reaction. At the same time, the inclination angle of the substrate is selectively varied to obtain the different grating periods.
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申请公布号 |
US6676846(B2) |
申请公布日期 |
2004.01.13 |
申请号 |
US20030339386 |
申请日期 |
2003.01.09 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD |
发明人 |
BANG DONG-SOO |
分类号 |
G02B5/18;(IPC1-7):H01L21/00;G01N27/26;G03B27/42 |
主分类号 |
G02B5/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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