发明名称 High aspect ratio patterning of glass film
摘要 A relatively facile, inexpensive method for patterning a layer of glass or a substrate involves patterning a seed material containing a nucleating agent adjacent a layer of thermally crystallizable glass and heat treating the seed material and the layer of thermally crystallizable glass to induce highly oriented crystal growth from the seed material through the thickness of the thermally crystallizable glass layer at selected portions thereof. After the heat treatment, the layer of thermally crystallizable glass is converted into a desired pattern of glass surrounded by crystalline material. The crystalline material is removed with an etchant to leave a desired glass pattern.
申请公布号 US6678453(B2) 申请公布日期 2004.01.13
申请号 US20020128808 申请日期 2002.04.24
申请人 CORNING INCORPORATED 发明人 BELLMAN ROBERT A.;UKRAINCZYK LJERKA
分类号 C03C10/00;C03C15/00;G02B6/12;G02B6/13;G02B6/136;(IPC1-7):G03C5/56 主分类号 C03C10/00
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