发明名称 |
Method for producing thin films |
摘要 |
Thin films are produced by a method wherein a material is heated in a furnace placed inside a vacuum system. An inert gas is flown over/through the heated material. The vapors of the material are entrained in the carrier gas which is then directed onto a substrate heated to a temperature below that of the furnace temperature and placed in close proximity to the exit of the furnace.
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申请公布号 |
US6676994(B2) |
申请公布日期 |
2004.01.13 |
申请号 |
US20010819277 |
申请日期 |
2001.03.28 |
申请人 |
UNIVERSITY OF DELAWARE |
发明人 |
BIRKMIRE ROBERT W.;ESER ERTEN;HANKET GREGORY M.;MCCANDLESS BRIAN E. |
分类号 |
C23C14/06;(IPC1-7):C23C16/00;C23C16/06 |
主分类号 |
C23C14/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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