| 摘要 |
FIELD: metallurgy and mechanical engineering. SUBSTANCE: nuclear plasmatron used for material treatment with temperature at point of material treatment as high as up to 105K. has housing, nuclear target, focusing lenses, synchronizer, band displacement mechanism, guide rolls, power supply, and control panel. Nuclear target is built of two cones with holes at their vortices for plasma escape which are built in moving band; cone axes are inclined through certain angle affording collision between plasma clots beyond plasmatron. Laser is made in the form of nitrogen-cooled semiconductor lasing array pumped with current pulse synchronized with movement of mentioned band. EFFECT: reduced size and mass compared with gas and high-frequency plasmotrons; enhanced temperature at material treatment point. 1 cl, 1 dwg |
