发明名称 SEMICONDUCTOR CIRCUIT AND ITS FABRICATING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor integrated circuit having high integrity by forming a plurality of semiconductor elements requiring integrity with an aligned crystallinity semiconductor film having an arranged crystallinity thereby providing a semiconductor circuit in which variation is suppressed between semiconductor elements. SOLUTION: In a part or entire thin film transistors constituting an analog circuit, e.g. a current mirror circuit, a differential amplifier circuit or an operational amplifier circuit, where high integrity is required for semiconductor elements, the channel forming region has an aligned crystallinity semiconductor film. High integrity can be expected for an analog circuit having an aligned crystallinity semiconductor film as the channel forming region of a thin film transistor. More specifically, the channel forming regions at least of the thin film transistors having the same polarity, among the thin film transistors constituting the analog circuit, are aligned. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004006741(A) 申请公布日期 2004.01.08
申请号 JP20030082139 申请日期 2003.03.25
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 KATO KIYOSHI;ATAMI TOMOAKI;ISOBE ATSUO
分类号 H01L21/20;H01L21/336;H01L29/786;(IPC1-7):H01L21/336 主分类号 H01L21/20
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